SEKI Technotron-ASTeX AX5200S-ECR
This MWPECVD reactor is equipped with a 3.0 kW microwave power generator that allow for high power density plasmas. In the same way, the reactor has an integrated ECR module to produce gentle plasmas.
Substrate temperature, chamber’s pressure and flows (up to 8 different gases) are automatically controlled.
Deposition of doped and undoped polycrystalline diamond films.
Hydrogen plasma: Reduction, etching and cleaning processes.
Oxygen Plasmas: Reduction, etching and cleaning processes.